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Appendix: Ion Channeling

Channeling extends RBS from composition into crystallography. It appears here as reference material: historically central to semiconductor science, now practiced at the same few accelerator laboratories as RBS itself.

When an MeV ion beam is aligned with a low-index axis of a single crystal, ions entering between rows are steered by a series of correlated small-angle collisions and never approach a lattice atom closely enough to backscatter. The backscattering yield collapses, to a few percent of the random-orientation value for a good crystal, as long as the beam stays within a critical angle of the axis,

ψc≈2Z1Z2e2Ed,\psi_c \approx \sqrt{ \frac{2 Z_1 Z_2 e^2}{E d} },

typically well under one degree at MeV energies. Here ψc\psi_c is the critical angle, Z1Z_1 and Z2Z_2 are the atomic numbers of the ion and the target atom, ee is the elementary charge, EE is the ion energy, and dd is the atomic spacing along the row.

Three measurements follow from this steering effect:

Channeling requires a goniometer and a single crystal, and its niches have largely been inherited by X-ray diffraction (strain, quality) and STEM (defects, interfaces). It appears in this appendix because the physics reappears as electron channeling in EBSD patterns and STEM imaging of aligned crystals, and because accidental channeling in an epitaxial substrate makes it read as anomalously transparent in RBS.

References and further reading

  1. L. C. Feldman, J. W. Mayer, and S. T. Picraux, Materials Analysis by Ion Channeling, Academic Press (1982).

  2. W.-K. Chu, J. W. Mayer, and M.-A. Nicolet, Backscattering Spectrometry, Academic Press (1978), Chapter 8.